Process Data

Stable Pattern Profile Within 400 RF·h

Overview

The Kessel™ Pishow® M2 metal etching system is a cluster tool for 8" IC mass production using the aluminum interconnect process. The optimized design of this proprietary system offers excellent etch uniformity (< 5% within wafer, and < 3% wafer to wafer), high etch selectivity (Al : PR > 2.4), and great particle control.

For aluminum interconnect line etch of the 0.11 μm technology node, Kessel™ Pishow® M2 has a throughput of up to 20,000 wafers per month. With mean-time-between-clean of up to 400 RF·h, Pishow® M2 offers excellent stability. This cost-effective system has a small footprint, which greatly enhances production capacity.