Process Data

Overview

The Kessel™ Pishow® M metal etching system is a cluster tool for 8" IC back-end-of-line (BEOL) aluminum processes. The optimized design of this proprietary system offers excellent etch uniformity (< 8% within wafer, and < 5% wafer to wafer) and great particle control.

In 4 μm aluminum pad etch applications, Kessel™ Pishow® M has a throughput of up to 8,000 wafers per month. This system offers cost-effective solutions and has a small footprint, greatly enhances process throughput and production capacity.